As a leading supplier of diamond film products, equipment and services, SP3 has announced that its CVD (Chemical Vapor Deposition) processing capability has been further expanded to provide ultra-smooth nanocrystalline diamonds with surface roughness below 10 nm. Controllable microcrystalline diamond products with surface roughness up to 10 microns. In addition, SP3's Model 650 chemical vapor deposition growth equipment can also meet the needs of some companies to produce their own diamond coated products.
SP3's ultra-smooth diamonds are ideal for applications such as wear-resistant surfaces including seals and bearings. Microcrystalline diamond films are ideal for chemical mechanical polishing applications. Both CVD diamond film products are suitable for use in harsh conditions and environmentally demanding applications where they exhibit high hardness, low coefficient of friction, high wear resistance and excellent thermal conductivity over any other material.
“SP3 offers unique solutions to the market thanks to our ability to manufacture deposition equipment that meets these application requirements,†said Dwyane Adara, President and Chief Operating Officer of SP3 Diamond Technology. “This way customers can Take advantage of our coating technology, or purchase our deposition equipment to grow ultra-smooth or roughness-controlled diamond coatings in their production processes. Our experience in delivering deposition equipment means that customers often get the current There are technical know-hows that will allow the diamond material they grow to perform to meet specific needs."
Ultra-smooth diamonds grown using SP3's chemical vapor deposition equipment are ideal for a variety of wear-resistant surfaces such as contact and non-contact coating seals and water systems where materials are critical.
Currently, wafer fabrication is evolving toward smaller geometries in 22nm and highly corrosive abrasives (including copper and tungsten) processing environments, while roughness-controlled diamonds are evolving into a chemical mechanical polishing. New Materials.
The diamond-coated surface is better able to withstand the harsh chemical conditions of both types of applications, whether it is a mud pump or a hot water environment, whether it is poor lubrication or corrosive chemical mechanical polishing with copper or tungsten. surroundings. In these cases, the extremely high hardness and chemical resistance of the diamond material greatly extend the service life of the product.
By using SP3's process to precisely control diamond growth and film properties, diamond materials with specific grain sizes and crystal orientations can be grown on substrates such as silicon carbide, thereby reducing the frictional heat of the contact surface and further extending Service life and reduced failure. The film can also be deposited and grown on many other substrate materials such as cemented carbide, silicon, tungsten carbide, and graphite.
SP3's ultra-smooth diamonds are ideal for applications such as wear-resistant surfaces including seals and bearings. Microcrystalline diamond films are ideal for chemical mechanical polishing applications. Both CVD diamond film products are suitable for use in harsh conditions and environmentally demanding applications where they exhibit high hardness, low coefficient of friction, high wear resistance and excellent thermal conductivity over any other material.
“SP3 offers unique solutions to the market thanks to our ability to manufacture deposition equipment that meets these application requirements,†said Dwyane Adara, President and Chief Operating Officer of SP3 Diamond Technology. “This way customers can Take advantage of our coating technology, or purchase our deposition equipment to grow ultra-smooth or roughness-controlled diamond coatings in their production processes. Our experience in delivering deposition equipment means that customers often get the current There are technical know-hows that will allow the diamond material they grow to perform to meet specific needs."
Ultra-smooth diamonds grown using SP3's chemical vapor deposition equipment are ideal for a variety of wear-resistant surfaces such as contact and non-contact coating seals and water systems where materials are critical.
Currently, wafer fabrication is evolving toward smaller geometries in 22nm and highly corrosive abrasives (including copper and tungsten) processing environments, while roughness-controlled diamonds are evolving into a chemical mechanical polishing. New Materials.
The diamond-coated surface is better able to withstand the harsh chemical conditions of both types of applications, whether it is a mud pump or a hot water environment, whether it is poor lubrication or corrosive chemical mechanical polishing with copper or tungsten. surroundings. In these cases, the extremely high hardness and chemical resistance of the diamond material greatly extend the service life of the product.
By using SP3's process to precisely control diamond growth and film properties, diamond materials with specific grain sizes and crystal orientations can be grown on substrates such as silicon carbide, thereby reducing the frictional heat of the contact surface and further extending Service life and reduced failure. The film can also be deposited and grown on many other substrate materials such as cemented carbide, silicon, tungsten carbide, and graphite.
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